Boron Nitride (BN) Sputtering Targets, Purity: 99.5%, Size: 3”, Thickness: 0.125”

$557.77

Boron Nitride (BN) Sputtering Target – Product Specification Table

Parameter Details
Product Name Boron Nitride (BN) Sputtering Target
Purity 99.5%
Size 3”
Thickness 0.125”
Material Description BN is a heat- and chemically resistant refractory compound existing in hexagonal (h-BN) and cubic (c-BN) forms; used in high-temperature, protective, and precision coating applications

Sputtering Process Description
Process Detail Description
Thin Film Deposition Deposits thin films on various substrates with excellent uniformity
Scalability Adaptable from R&D to medium and large-scale production
Reaction Zone Chemical reactions may occur on target surface, in-flight, or on substrate
Process Control Multiple controllable parameters allow precision over microstructure and growth

Applications of Sputtering Targets
Application Area Description
Thin Film Deposition Material is sputtered from the target onto substrates such as silicon wafers
Semiconductor Etching Used for sputter etching where high anisotropy is required
Analytical Techniques (SIMS) Enables detection of elemental composition and trace impurities
Space Weathering Studies Used to simulate and analyze sputtering on Moon/asteroid surfaces

Properties & Uses of Boron Nitride
BN Form Key Properties Applications
Hexagonal BN (h-BN) Soft, lubricating, low friction, thermally conductive, electrically insulating Lubricants, metal forming dies, cosmetic additives, high-temperature applications
Cubic BN (c-BN) Second hardest material after diamond, high thermal conductivity, high wear resistance, chemically stable at high temperature Cutting tools, protective coatings, electrical insulation, optical coatings

Coating & Industrial Applications

Category Details
Cutting Tools c-BN coatings offer high hardness and stability for dry cutting, high-speed machining, and hard material cutting
Protective Coatings BN films used in thermal protection and chemically harsh environments
Optical & Electrical Layers High electrical resistivity and thermal stability make BN suitable for optical and insulating films
PVD Sputtering Advantages Deposits thin or thick films, sharp edges, complex shapes, and requires lower coating temperatures
For larger inquiries, please contact us.

Download ……………………….. MSDS

Size: 1 piece

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