Yttrium Ferrite (Y₃Fe₅O₁₂) Sputtering Target – 1″, 0.125″
Product Table
| Property | Specification |
|---|---|
| Material | Yttrium Ferrite (Y₃Fe₅O₁₂) |
| Purity | 99.9% |
| Size | 1” |
| Thickness | 0.125” |
| Form | Sputtering Target |
Description
Yttrium Ferrite (Y₃Fe₅O₁₂) sputtering targets are designed for producing high-quality thin films across various substrate types. The sputtering process ensures repeatability, scalability, and precise control of film microstructure by adjusting process parameters. This makes it suitable for both small-scale R&D and large-area production.
Applications
-
Thin-film deposition by sputtering onto substrates such as silicon wafers
-
Semiconductor sputter etching when high anisotropy is required
-
Material analysis through SIMS, enabling detection of extremely low impurity levels
-
Space research applications, as sputtering contributes to space weathering effects on asteroids and the Moon.
