| Category | Details |
|---|---|
| Product Name | Ytterbium Oxide (Yb₂O₃) Sputtering Targets |
| Purity | 99.99% |
| Size | 1” |
| Thickness | 0.125” |
| Description | Sputtering deposits thin films from various materials onto diverse substrates. The process is repeatable, scalable, and allows precise control over film growth and microstructure. |
Applications
| Application Area | Details |
|---|---|
| Thin Film Deposition | Deposits thin films by eroding material from the target onto substrates such as silicon wafers. |
| Space / Space Weathering | Helps study physical and chemical changes on airless bodies like the Moon and asteroids. |
