Product Table
| Property | Specification |
|---|---|
| Material | Yttrium (Y) |
| Purity | 99.9% |
| Size | 1” |
| Thickness | 0.250” |
| Form | Sputtering Target |
Description
Yttrium (Y) sputtering targets are widely used for depositing high-quality thin films across various substrate shapes and sizes. The sputtering process is repeatable, scalable from research-level production to large-area industrial applications, and allows precise control of film composition, growth, and microstructure. Chemical reactions during deposition may occur on the target, in-flight, or directly on the substrate depending on process parameters.
Applications
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Thin-film deposition: Transfers target material to substrates such as silicon wafers through controlled sputtering.
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Semiconductor etching: Suitable for processes requiring high anisotropy where selectivity is less critical.
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Material analysis: Used in SIMS and similar techniques to measure composition and detect extremely low impurity levels.
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Space science: Helps simulate space weathering effects on airless bodies like the Moon and asteroids.
If you want, I can prepare a combined table for all Yttrium sputtering target sizes to simplify product listing.
