Ytterbium Oxide (Yb₂O₃) Sputtering Targets — Product Table
| Category | Details |
|---|---|
| Product Name | Ytterbium Oxide (Yb₂O₃) Sputtering Targets |
| Purity | 99.99% |
| Size | 2” |
| Thickness | 0.125” |
| Description | Sputtering is a proven method for depositing thin films from various materials onto diverse substrate shapes and sizes. The process is repeatable, scalable from R&D to production, and allows precise control over film growth and microstructure depending on process parameters. |
Applications
| Application Area | Explanation |
|---|---|
| Thin Film Deposition | Deposits thin films by eroding material from the target onto substrates such as silicon wafers. |
| Semiconductor Etching | Used in sputter etching when high etching anisotropy is required and selectivity is less critical. |
| Material Analysis (SIMS) | Target is sputtered at a constant rate for mass spectrometry to determine composition and detect trace impurities. |
| Space Science / Space Weathering | Contributes to physical and chemical changes on airless bodies such as the Moon and asteroids. |
