Lanthanum Strontium Manganate (La₀.₇Sr₀.₃MnO₃) Sputtering Target (3” × 0.250”):
| Category | Details |
|---|---|
| Product Name | Lanthanum Strontium Manganate (La₀.₇Sr₀.₃MnO₃) Sputtering Target |
| Purity | 99.9% |
| Size | 3” |
| Thickness | 0.250” |
| Description | Sputtering is a reliable method to deposit thin films from a variety of materials onto substrates of different shapes. The process is repeatable, scalable from R&D to medium/large production, and allows precise control of film growth and microstructure. |
| Key Features | • Scalable from small R&D to large production batches • Precise control over microstructure and film growth • Compatible with diverse substrate shapes and sizes |
| Applications | • Thin-film deposition on substrates like silicon wafers • Semiconductor target etching requiring high anisotropy • Analytical sputtering (SIMS) for composition and impurity detection • Space applications simulating space weathering on airless bodies such as asteroids and the Moon. |
