Lanthanum Strontium Manganate (La₀.₇Sr₀.₃MnO₃) Sputtering Target (1” × 0.250”):
| Category | Details |
|---|---|
| Product Name | Lanthanum Strontium Manganate (La₀.₇Sr₀.₃MnO₃) Sputtering Target |
| Purity | 99.9% |
| Size | 1” |
| Thickness | 0.250” |
| Description | Sputtering is a reliable technique for depositing thin films from a wide variety of materials onto diverse substrate shapes. The process is repeatable and scalable from small R&D projects to medium/large production batches, allowing precise control over growth and microstructure. |
| Key Features | • Scalable from research to production • Precise control over microstructure and film growth • Compatible with various substrate shapes and sizes |
| Applications | • Thin-film deposition on substrates like silicon wafers • Semiconductor target etching requiring high anisotropy • Analytical sputtering (SIMS) for material composition and trace impurity detection • Space applications, simulating space weathering on airless bodies such as asteroids and the Moon. |
