Cerium Oxide (CeO₂) Sputtering Targets, 6” × 0.125”:
| Property | Specification |
|---|---|
| Product Name | Cerium Oxide (CeO₂) Sputtering Targets |
| Purity | 99.99% |
| Size | 6” |
| Thickness | 0.125” |
| Description | Sputtering is a reliable thin-film deposition method suited for various substrate shapes. It is repeatable, scalable from R&D to medium/large production, and allows significant control over film growth and microstructure. Chemical reactions may occur on the target surface, during flight, or on the substrate depending on process conditions. |
| Applications of Sputtering Targets | – Thin-film deposition by sputtering onto substrates like silicon wafers – Semiconductor sputter-etching requiring high anisotropy – Material analysis by controlled sputter removal (e.g., SIMS) – Space-weathering studies involving asteroids and the Moon |
| Material Information (Cerium Oxide) | Cerium, the most abundant lanthanide, forms CeO₂ with a high refractive index and dielectric constant. It is used in corrosion-resistant coatings, polishing materials, automotive catalysts, gas sensors, electrolyte materials, oxygen-storage systems, fuel cells, microelectronics, optical, electro-optical, and optoelectronic devices due to its moderate band gap and strong dielectric properties. |
