Cerium Oxide (CeO2) Sputtering Targets:
| Property | Specification |
|---|---|
| Product Name | Cerium Oxide (CeO2) Sputtering Targets, indium |
| Purity | 99.99% |
| Size | 2” |
| Thickness | 0.125” |
| Description | Sputtering is a proven technology capable of depositing thin films from a wide variety of materials onto diverse substrate shapes and sizes. The process with sputter targets is repeatable and scalable from small R&D projects to medium/large substrate production batches. Chemical reactions can occur on the target surface, in-flight, or on the substrate depending on process parameters. These multiple parameters make sputter deposition complex but allow precise control over growth and microstructure. |
| Applications | – Film deposition onto substrates (e.g., silicon wafers) – Semiconductor etching where high anisotropy is needed – Material analysis via SIMS (secondary ion mass spectroscopy) – Space applications: space weathering on airless bodies like asteroids and the Moon |
| Material Info | Cerium is a lanthanide and the most abundant rare-earth element in the Earth’s crust. Cerium oxide has high refractive index and dielectric constant, is corrosion resistant, inexpensive, and widely used. Applications include polishing, automotive exhaust catalysts, gas sensors, electrolytes, oxygen storage, oxide fuel cells, microelectronics, optical, electro-optical, and optoelectronic devices. |
