Lanthanum Titanate (LaTiO3) Sputtering Targets, Purity: 99.9%, Size: 8”, Thickness: 0.250”

Category Details
Product Name Lanthanum Titanate (LaTiO3) Sputtering Targets
Purity 99.9%
Size 8”
Thickness 0.250”
Description Sputtering deposits thin films from a variety of materials onto diverse substrate shapes. The process is repeatable, scalable, and allows precise control over film growth and microstructure.

Applications

Semiconductor EtchingUsed in sputter etching when high anisotropy is required and selectivity is not a concern.

Material Analysis (SIMS)Target is sputtered at a constant rate; mass spectrometry measures atom concentration and identity, detecting trace impurities.

Application Details
Thin Film Deposition Material is eroded from the target onto substrates such as silicon wafers to form thin films.
Space / Space Weathering Helps study changes in physical and chemical properties of airless bodies like asteroids and the Moon.
For larger inquiries, please contact us.

Download ……………………….. MSDS

Size: 1 piece

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