Lanthanum Strontium Manganate (La₀.₉Sr₀.₁MnO₃) Sputtering Target (3” × 0.125”):
| Category | Details |
|---|---|
| Product Name | Lanthanum Strontium Manganate (La₀.₉Sr₀.₁MnO₃) Sputtering Target, Indium |
| Purity | 99.9% |
| Size | 3” |
| Thickness | 0.125” |
| Description | Sputtering technology deposits thin films from various materials onto diverse substrates. Process is scalable from R&D to medium-large production, allowing precise control over reactions and microstructure. |
| Key Features | • Repeatable and scalable • High control over growth and microstructure • Suitable for diverse substrate shapes and sizes |
| Applications | • Thin-film deposition on substrates like silicon wafers • Semiconductor etching where high anisotropy is needed • Analytical sputtering (SIMS) for material composition and trace impurities • Space weathering studies on airless bodies such as asteroids and the Moon |
