| Category | Details |
|---|---|
| Product Name | Lanthanum Titanate (LaTiO₃) Sputtering Target |
| Purity | 99.9% |
| Size | 1” |
| Thickness | 0.125” |
| Description | Sputtering technology deposits thin films from various materials onto diverse substrates. Process is scalable from R&D to medium-large production, with precise control over target reactions and microstructure. |
| Key Features | • Repeatable and scalable • High control over growth and microstructure • Suitable for diverse substrate shapes and sizes |
| Applications | • Thin-film deposition (e.g., silicon wafers) • Semiconductor etching requiring high anisotropy • Analytical sputtering (SIMS) for composition and trace impurities • Space weathering studies on airless bodies like asteroids and the Moon. |
Lanthanum Titanate (LaTiO3) Sputtering Targets, Purity: 99.9%, Size: 1”, Thickness: 0.125”
$542.54
Size: 1 piece
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