Lead Zirconium Titanate/PZT (O5PbTiZr) Sputtering Targets
Specifications
| Property | Value |
|---|---|
| Purity | 99.9% |
| Size | 8” |
| Thickness | 0.125” |
Sputtering is a proven technology capable of depositing thin films from a wide variety of materials onto diverse substrate shapes and sizes.
The process using sputter targets is repeatable and can be scaled from small research and development projects to production batches involving medium to large substrate areas. Chemical reactions may occur on the target surface, in-flight, or on the substrate depending on the process parameters.
These numerous parameters make sputter deposition a complex process but provide experts significant control over the growth and microstructure of the films.
Applications of Sputtering Targets
Sputtering targets are used for film deposition. Thin-film deposition through sputtering involves eroding material from a “target” source onto a “substrate,” such as a silicon wafer.
Semiconductor sputtering targets are also used for etching. Sputter etching is chosen when a high degree of etching anisotropy is needed and selectivity is not a primary concern.
Sputter targets are used for analysis by gradually etching away the material. An example is secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the material is sputtered, the concentration and identity of the atoms are measured using mass spectrometry. With the aid of the sputtering target, the composition of the material can be determined, including extremely low concentrations of impurities.
Sputtering also has applications in space. It is one of the processes involved in space weathering, which alters the physical and chemical properties of airless bodies such as asteroids and the Moon.
Lead Zirconium Titanate Information
Lead zirconium titanate is an inorganic ceramic perovskite material that exhibits a strong piezoelectric effect, meaning it changes shape when exposed to an electric field.
It is widely used in practical applications such as ultrasonic transducers and piezoelectric resonators.
Preparation of PZT Thin Films
PZT thin films can be prepared using techniques such as the sol-gel process, pulsed laser deposition, radio frequency (RF) magnetron sputtering, and metal organic chemical vapour deposition (MOCVD). These techniques can affect the electrical and structural properties of the films.
RF magnetron sputtering is considered a reliable method because it produces thin films with excellent uniformity and smooth surface quality.
