Lead Zirconium Titanate/PZT (O5PbTiZr) Sputtering Targets
Specifications
Purity: 99.9%, Size: 5”, Thickness: 0.125”
Sputtering is a proven technology used to deposit thin films from a wide variety of materials onto diverse substrate shapes and sizes.
The process using sputter targets is repeatable and can be scaled from small research and development projects to production batches involving medium to large substrate areas. Chemical reactions may occur on the target surface, during transport, or on the substrate depending on the process parameters.
These numerous parameters make sputter deposition a complex process, yet they allow experts significant control over film growth and microstructure.
Applications of Sputtering Targets
Sputtering targets are used for film deposition. Thin-film deposition through sputtering involves eroding material from a “target” source onto a “substrate,” such as a silicon wafer.
Semiconductor sputtering targets are also used for etching. Sputter etching is preferred when a high degree of etching anisotropy is required and selectivity is not a concern.
Sputter targets are additionally used for analytical applications by etching away the target material. One example is secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As sputtering progresses, the concentration and identity of sputtered atoms are measured using mass spectrometry. With the help of the sputtering target, the composition of the target material can be determined, and extremely low impurity concentrations can be detected.
Sputtering also has applications in space. It is one of the processes responsible for space weathering, which alters the physical and chemical properties of airless bodies such as asteroids and the Moon.
Lead Zirconium Titanate Information
Lead zirconium titanate is an inorganic compound and a ceramic perovskite material that exhibits a strong piezoelectric effect—meaning it changes shape when an electric field is applied. It is used in various practical applications, including ultrasonic transducers and piezoelectric resonators.
Preparation of PZT Thin Films
The preparation of PZT thin films has been explored using techniques such as the sol-gel process, pulsed laser deposition, radio frequency (RF) magnetron sputtering, and metal organic chemical vapour deposition (MOCVD). These methods can influence the electrical and structural properties of the resulting thin films.
In addition, RF magnetron sputtering is considered a reliable method because it produces thin films with good uniformity and smooth surfaces.
