Lead Zirconium Titanate/PZT (O5PbTiZr) Sputtering Targets
Specifications
| Property | Value |
|---|---|
| Purity | 99.9% |
| Size | 3” |
| Thickness | 0.125” |
Sputtering is a proven technology used to deposit thin films from a wide range of materials onto diverse substrate shapes and sizes.
The process using sputter targets is repeatable and can be scaled from small research and development projects to production batches involving medium to large substrate areas. Chemical reactions may occur on the target surface, during transport, or on the substrate depending on the specific process parameters.
These numerous variables make sputter deposition a complex procedure, yet they provide experts with substantial control over the growth and microstructure of the deposited films.
Applications of Sputtering Targets
Sputtering targets are used for film deposition. Thin-film deposition through sputtering involves eroding material from a “target” source onto a “substrate,” such as a silicon wafer.
Semiconductor sputtering targets are also used for etching. Sputter etching is selected when a high degree of etching anisotropy is required and selectivity is not a primary concern.
Sputter targets are also used for analytical applications by etching away the target material. An example is secondary ion spectroscopy (SIMS), where the target is sputtered at a constant rate. As sputtering proceeds, the concentration and identity of sputtered atoms are measured using mass spectrometry. With the aid of the sputtering target, the composition of the material can be determined, and extremely low impurity levels can be detected.
Sputtering also has applications in space. It is one of the processes responsible for space weathering, which alters the physical and chemical properties of airless bodies such as asteroids and the Moon.
Lead Zirconium Titanate Information
Lead zirconium titanate is an inorganic compound and a ceramic perovskite material with a pronounced piezoelectric effect, meaning it changes shape when exposed to an electric field. It is widely used in applications such as ultrasonic transducers and piezoelectric resonators.
Preparation of PZT Thin Films
The preparation of PZT thin films has been investigated through several techniques, including the sol-gel process, pulsed laser deposition, radio frequency (RF) magnetron sputtering, and metal organic chemical vapour deposition (MOCVD). These techniques can influence the electrical and structural properties of the resulting thin films.
Additionally, RF magnetron sputtering is regarded as a reliable method due to its ability to produce thin films with excellent uniformity and smooth surface quality.
