Lead Zirconium Titanate/PZT (O5PbTiZr) Sputtering Targets
Specifications
| Property | Value |
|---|---|
| Purity | 99.9% |
| Size | 1” |
| Thickness | 0.250” |
Sputtering is a proven technology capable of depositing thin films from a wide variety of materials onto diverse substrate shapes and sizes.
The process using sputter targets is repeatable and can be scaled from small research and development projects to production batches involving medium to large substrate areas. Chemical reactions may occur on the target surface, in-flight, or on the substrate depending on the process parameters.
These numerous parameters make sputter deposition a complex process but give experts a high degree of control over the growth and microstructure of the films.
Applications of Sputtering Targets
Sputtering targets are used for film deposition. Thin-film deposition through sputtering involves eroding material from a “target” source onto a “substrate,” such as a silicon wafer.
Semiconductor sputtering targets are also used for etching. Sputter etching is selected when a high degree of anisotropy is needed and selectivity is not a primary concern.
Sputter targets are also used for analysis by gradually etching away the material. An example is secondary ion spectroscopy (SIMS), where the target is sputtered at a constant rate. As sputtering progresses, the concentration and identity of sputtered atoms are measured using mass spectrometry. With the help of the sputtering target, the composition of the material can be determined, and even extremely low concentrations of impurities can be detected.
Sputtering also plays a role in space applications. It is one of the processes responsible for space weathering, which changes the physical and chemical properties of airless bodies such as asteroids and the Moon.
Lead Zirconium Titanate Information
Lead zirconium titanate is an inorganic ceramic perovskite material with a strong piezoelectric effect, meaning it changes shape when exposed to an electric field.
It is widely used in practical applications such as ultrasonic transducers and piezoelectric resonators and has a high operating temperature. Its physical strength, chemical inertness, tailorability, and relatively low manufacturing cost make it one of the most commonly used piezoelectric ceramics in industry.
Lead zirconium titanate has the highest dielectric constant among advanced ceramic materials due to its perovskite structure with high orientation. This property enhances the storage capability of capacitors. In addition to being ferroelectric, its large band gap also makes it suitable as a semiconductor material.
Preparation of PZT Thin Films
PZT thin films can be prepared using various techniques, including the sol-gel process, pulsed laser deposition, radio frequency (RF) magnetron sputtering, and metal organic chemical vapour deposition (MOCVD). These techniques influence the electrical and structural properties of the thin films.
RF magnetron sputtering is considered reliable because it produces uniform and smooth thin films.
