Cobalt Iron Boron (Co-Fe-B) Sputtering Target — Product Specifications
| Property | Details |
|---|---|
| Material | Cobalt Iron Boron (Co-Fe-B) Alloy |
| Purity | 99.95% |
| Size | 3” |
| Thickness | 0.125” |
| Description | Sputtering is a proven thin-film deposition technology for diverse substrates. Process is repeatable, scalable, and allows precise control over growth and microstructure. Reactions may occur on the target surface, in-flight, or on the substrate. |
Applications of Sputtering Targets
| Application Area | Explanation |
|---|---|
| Film Deposition | Material from the target is eroded and deposited onto a substrate, e.g., silicon wafers. |
| Semiconductor Etching | Sputter etching used where high anisotropy is required, selectivity is secondary. |
| Analytical Techniques (SIMS) | Enables analysis of material composition and trace impurity detection by measuring sputtered atoms. |
| Space Science | Contributes to space weathering, altering physical and chemical properties of airless bodies like asteroids and the Moon. |
Alloy-Specific Applications (Co-Fe-B)
| Property / Requirement | Explanation |
|---|---|
| Mechanical Hardness & Wear Resistance | Boron alloys with Co-Fe provide high hardness, excellent wear, and corrosion resistance, ideal for coatings. |
| Electrical Conductivity | Excellent conductivity and resistance to attack by molten metals. |
| High Tensile Strength & Thermal Stability | Suitable for high-stress and high-temperature applications like metal ribbons for razor blades and tire cords. |
| Soft Magnetic Properties | Amorphous Co-Fe-B alloys combine high mechanical hardness with soft magnetic characteristics, ideal for transformer cores and toroids. |
| Coating Applications | Surface enhancement for metals and ceramics, improving industrial and electronic performance. |
