Chromium Oxide (Cr₂O₃) Sputtering Target – Product Details
| Parameter | Details |
|---|---|
| Product Name | Chromium Oxide (Cr₂O₃) Sputtering Target |
| Purity | 99.8% – 99.9% |
| Size | 4” diameter |
| Thickness | 0.125” |
| Material Formula | Cr₂O₃ |
| Appearance | Green inorganic compound |
| Film Characteristics | High hardness, low friction, optical and electrical suitability |
Applications
| Application Area | Description |
|---|---|
| Thin Film Deposition | Used to deposit high-quality thin films on various substrates using sputtering processes. |
| Semiconductor Fabrication | Useful in sputter etching where high anisotropy is required. |
| Material Analysis (SIMS) | Target is sputtered at a constant rate to analyze elemental composition and detect low-level impurities. |
| Optical & Electrical Devices | Used in integrated circuits, flat panel displays, and optical components. |
| Magnetic Recording | Used as protective hard coatings in magnetic heads and media to resist wear and corrosion. |
| Space & Planetary Science | Plays a role in sputtering processes that simulate space weathering of asteroids and lunar surfaces. |
