Chromium Oxide (Cr₂O₃) Sputtering Target – Product Details
| Parameter | Details |
|---|---|
| Product Name | Chromium Oxide (Cr₂O₃) Sputtering Target |
| Purity | 99.8% – 99.9% |
| Size | 3” diameter |
| Thickness | 0.250” |
| Chemical Formula | Cr₂O₃ |
| Film Properties | High hardness, low friction, suitable for optical/electrical coatings |
| Applications | Thin film deposition, semiconductor processing, SIMS analysis, optical coatings, magnetic recording, space weathering studies |
Applications of Chromium Oxide (Cr₂O₃) Sputtering Targets
| Application Area | Description |
|---|---|
| Thin Film Deposition | Used to deposit uniform thin films by sputtering onto substrates such as silicon wafers. |
| Semiconductor Etching | Supports sputter etching processes that require high anisotropy where selectivity is not critical. |
| Analytical Techniques (SIMS) | Provides controlled sputtering to measure atomic species and detect trace impurities. |
| Space Science | Helps study sputtering effects in space weathering on lunar/asteroid surfaces. |
| Optical & Electrical Devices | Used in integrated circuits, flat panel displays, and optical components requiring Cr₂O₃ thin films. |
| Magnetic Recording | Hard coatings for corrosion and wear protection in magnetic heads and DCC tape-bearing surfaces. |
