Chromium Oxide (Cr₂O₃) Sputtering Target – Product Details
| Parameter | Details |
|---|---|
| Product Name | Chromium Oxide (Cr₂O₃) Sputtering Target |
| Purity | 99.8% – 99.9% |
| Size | 3” diameter |
| Thickness | 0.125” |
| Chemical Formula | Cr₂O₃ |
| Material Characteristics | High hardness, low friction coefficient, stable structure |
| Film Characteristics | Suitable for optical, electrical, protective, and hard coating applications |
Applications of Chromium Oxide (Cr₂O₃) Sputtering Targets
| Application Area | Description |
|---|---|
| Thin Film Deposition | Used to deposit uniform films by sputtering onto substrates such as silicon wafers. |
| Semiconductor Etching | Enables sputter etching where high anisotropy is required and selectivity is not critical. |
| Analytical Techniques (SIMS) | Supports controlled sputtering for detecting elemental composition and impurities. |
| Space Weathering Studies | Utilized to study sputtering effects on airless planetary bodies such as the Moon and asteroids. |
| Optical & Electrical Devices | Important for integrated circuits, flat panel displays, and optical coating applications. |
| Hard Coating / Magnetic Recording | Used in protective coatings for magnetic heads and tape-bearing surfaces in DCC systems. |
