Chromium Oxide (Cr₂O₃) Sputtering Target — Specifications
| Property | Details |
|---|---|
| Material | Chromium Oxide (Cr₂O₃) |
| Purity | 99.8% |
| Size | 2” |
| Thickness | 0.125” |
| Description | Proven sputtering technology for thin-film deposition on diverse substrates. Scalable from R&D to medium/large production. Allows precise control over growth and microstructure. |
Applications of Sputtering Targets
| Application Area | Explanation |
|---|---|
| Film Deposition | Deposits thin films onto substrates like silicon wafers by eroding target material. |
| Semiconductor Etching | Provides high etching anisotropy where selectivity is not critical. |
| Analytical Techniques (SIMS) | Enables composition analysis and detection of trace impurities via mass spectrometry. |
| Space Science | Contributes to space weathering, altering properties of airless bodies like asteroids and the Moon. |
Chromium Oxide-Specific Applications
| Property / Requirement | Explanation |
|---|---|
| Hard Coatings | Cr₂O₃ thin films exhibit high hardness and low friction, suitable for wear-resistant applications. |
| Optical & Electrical Applications | Used in integrated circuits, flat panel displays, and optical devices requiring thin films. |
| Magnetic Recording | Protective coatings for digital compact cassette (DCC) heads, preventing corrosion and wear. |
| Material Replacement | Candidate to replace transition metal nitrides or Al₂O₃ in specialized applications due to hardness and friction properties. |
