Chromium (Cr) Sputtering Target – Product Details
| Parameter | Details |
|---|---|
| Product Name | Chromium (Cr) Sputtering Target |
| Purity | 99.95% |
| Size | 4” diameter |
| Thickness | 0.250” |
| Material Characteristics | Silvery, lustrous, hard, brittle, high corrosion resistance, high mirror polish |
| Film Characteristics | Suitable for thin film deposition, functional coatings, and corrosion-resistant layers |
Applications of Chromium (Cr) Sputtering Targets
| Application Area | Description |
|---|---|
| Thin Film Deposition | Deposits uniform films by sputtering onto substrates such as silicon wafers. |
| Semiconductor Etching | Enables sputter etching where high anisotropy is required and selectivity is less critical. |
| Analytical Techniques (SIMS) | Controlled sputtering for detecting elemental composition and extremely low impurity concentrations. |
| Space Weathering Studies | Used to study sputtering effects on airless planetary bodies like the Moon and asteroids. |
| Automotive & Industrial Coatings | Produces shiny, corrosion-resistant coatings on wheels, bumpers, hydro-pneumatic cylinders, piston rings, slide valves, and other components. |
| Electronic Components & Displays | Applied in PVD for functional coatings in displays, photovoltaic cells, batteries, and electronic devices. |
| Vacuum Chroming & Decorative Coatings | Used in vacuum chroming of watches, household appliance parts, mirrors, tinted glass, and other decorative surfaces. |
