Carbon (C) Sputtering Target – Product Details
| Parameter | Details |
|---|---|
| Product Name | Carbon (C) Sputtering Target, indium |
| Purity | 99.999% |
| Size | 1” diameter |
| Thickness | 0.125” |
| Material Characteristics | High-purity pyrolytic graphite, layered structure, excellent thermal and electrical conductivity, chemically stable |
| Film Characteristics | Ideal for thin film deposition, conductive coatings, and analytical applications |
Applications of Carbon (C) Sputtering Targets
| Application Area | Description |
|---|---|
| Thin Film Deposition | Deposits uniform films by sputtering onto substrates such as silicon wafers. |
| Semiconductor Etching | Enables sputter etching for processes requiring high anisotropy and moderate selectivity. |
| Analytical Techniques (SIMS) | Controlled sputtering allows detection of elemental composition and extremely low impurity concentrations. |
| Space Weathering Studies | Used in research to simulate sputtering effects on airless planetary bodies like asteroids and the Moon. |
| Electronics & Functional Coatings | Applied in PVD for conductive coatings, electrodes, and other electronic components. |
