Calcium Manganate (CaMnO₃) Sputtering Target – Product Details
| Parameter | Details |
|---|---|
| Product Name | Calcium Manganate (CaMnO₃) Sputtering Target |
| Purity | 99.9% |
| Size | 4” diameter |
| Thickness | 0.250” |
| Material Characteristics | High-purity ceramic material, stable under sputtering conditions, suitable for oxide thin films |
| Film Characteristics | Enables uniform thin film deposition, controllable microstructure, and high reproducibility |
Applications of Calcium Manganate Sputtering Targets
| Application Area | Description |
|---|---|
| Thin Film Deposition | Deposits thin films onto substrates such as silicon wafers or glass. |
| Semiconductor Etching | Used in sputter etching where high anisotropy is required and selectivity is not critical. |
| Analytical Techniques (SIMS) | Enables elemental analysis and precise measurement of low-concentration impurities. |
| Space Applications | Models sputtering effects in space weathering, affecting asteroids, the Moon, and other airless bodies. |
| Electronics & Functional Coatings | Suitable for producing oxide layers in electronic devices and functional coatings. |
