Bismuth Oxide (Bi₂O₃) Sputtering Targets
Purity: 99.9% Size: 2” Thickness: 0.125”
Sputtering is a reliable and widely used technique for depositing thin films from a variety of materials onto substrates of different shapes and sizes. The process is highly repeatable and scalable, making it suitable for small R&D experiments as well as medium- to large-area production batches. Depending on the process parameters, chemical reactions can occur on the target surface, during particle flight, or on the substrate. Although complex, sputter deposition provides a high degree of control over film growth and microstructure.
Applications of Sputtering Targets
Thin Film Deposition
Sputtering targets are used to deposit thin films by eroding material from a “target” and transferring it onto a substrate such as a silicon wafer.
Semiconductor Processing
Sputter etching enables high anisotropy and is commonly used where directional etching is required and material selectivity is not the primary concern.
Analytical Techniques
In surface analysis methods such as Secondary Ion Mass Spectroscopy (SIMS), sputtering removes material at a constant rate. The sputtered atoms are analyzed through mass spectrometry to determine composition and detect extremely low impurity levels.
Space Science
Sputtering is also involved in space weathering processes, altering the physical and chemical properties of airless bodies such as asteroids and the lunar surface.
Material Overview: Bismuth Oxide (Bi₂O₃)
Bismuth oxide (Bi₂O₃) is one of the most significant bismuth compounds and is widely studied for its strong optical and electrical characteristics. Key properties include:
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Wide energy bandgap (2–4 eV)
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High refractive index
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High oxygen-ion conductivity at medium and elevated temperatures
These characteristics make Bi₂O₃ a promising material for:
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Optoelectronics
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Solar cell technologies
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Solid oxide fuel cells (SOFCs)
Bi₂O₃ exhibits several polymorphs—α, β, γ, and δ—each possessing unique crystal structures and corresponding electrical, optical, and mechanical properties. Among them, the monoclinic α-phase (low temperature) and face-centered cubic δ-phase (high temperature) are stable, while the other forms are metastable.
Magnetron Sputtering and Functional Applications
Magnetron sputtering is widely used for Bi₂O₃ deposition due to its high deposition rate, dense and adhesive films, and compatibility with large-area commercial systems.
Bi₂O₃-based thin films exhibit high ionic conductivity, making them suitable for:
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SOFC electrolytes
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Oxygen sensors
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Gas sensors
Additionally, bismuth oxide materials show:
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High dielectric permittivity
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High refractive index
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Photoluminescence
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Strong photocatalytic activity under visible light (useful for water splitting and environmental decontamination)
Bi-containing hetero-metallic oxides are further considered promising in microelectronics due to their high charge-carrier mobility and long electron mean free path. Thin bismuth films also exhibit a semiconductor transition at approximately 30 nm—expanding their technological potential.
