Bismuth Ferrite (BiFeO3) Sputtering Targets, Indium
Purity: 99.9% Size: 6” Thickness: 0.250”
Sputtering is a reliable method for depositing thin films from diverse materials onto substrates of various shapes and sizes. The process is highly repeatable and scalable, suitable for both small R&D projects and medium-to-large production batches. Chemical reactions may occur on the target surface, in-flight, or on the substrate depending on process parameters, giving experts precise control over film growth and microstructure.
Applications of Sputtering Targets
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Thin Film Deposition: Deposits thin films on substrates such as silicon wafers via material erosion from the target.
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Semiconductor Etching: Provides high etching anisotropy where selectivity is not critical.
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Analytical Applications: Enables precise composition analysis and detection of trace impurities, as in Secondary Ion Mass Spectroscopy (SIMS).
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Space Applications: Plays a role in space weathering, altering the physical and chemical properties of airless bodies like asteroids and the Moon.
About Bismuth Ferrite (BiFeO3)
Bismuth ferrite (BiFeO3) is a perovskite-structured inorganic compound and a leading multiferroic material. Targets are fabricated through high-temperature sintering or recrystallization of Bi and Fe oxide mixtures to produce single-phase BiFeO3. Indium bonding is recommended for optimal performance.
This Pb-free ferroelectric material is known for its large remnant polarization, high Curie temperature, and high antiferromagnetic Néel temperature. It is one of the rare materials exhibiting both magnetic and ferroelectric properties at and above room temperature. Its polarization-induced photovoltaic properties and 3.3 eV direct band gap make BiFeO3 films highly suitable for ferroelectric photovoltaic applications, outperforming most other ferroelectric materials.
