Bismuth Ferrite (BiFeO3) Sputtering Targets, Indium
Purity: 99.9%
Size: 5”
Thickness: 0.250”
Sputtering is a well-established technique for depositing thin films from a wide variety of materials onto substrates of various shapes and sizes. The process is highly repeatable and scalable, suitable for both small research projects and medium-to-large production batches. Chemical reactions may occur on the target surface, in-flight, or on the substrate depending on process parameters, giving experts precise control over film growth and microstructure.
Applications of Sputtering Targets
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Thin Film Deposition: Material is eroded from the target to deposit films on substrates like silicon wafers.
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Semiconductor Etching: Provides high etching anisotropy when selectivity is not critical.
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Analytical Uses: Enables detailed composition analysis and detection of trace impurities, such as in Secondary Ion Mass Spectroscopy (SIMS).
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Space Applications: Contributes to space weathering, affecting the physical and chemical properties of airless bodies like asteroids and the Moon.
About Bismuth Ferrite (BiFeO3)
Bismuth ferrite (BiFeO3) is an inorganic compound with a perovskite structure and is among the most promising multiferroic materials. Sputtering targets are produced via high-temperature sintering or recrystallization of Bi and Fe oxide mixtures to form single-phase BiFeO3. Indium bonding is recommended for optimal performance.
This Pb-free ferroelectric material is known for its large remnant polarization, high Curie temperature, and high antiferromagnetic Néel temperature. It uniquely exhibits both magnetic and ferroelectric properties at and above room temperature. Its strong polarization-induced photovoltaic properties and 3.3 eV direct band gap make BiFeO3 films highly suitable for advanced ferroelectric photovoltaic applications.
