Bismuth Ferrite (BiFeO3) Sputtering Targets, Indium
Purity: 99.9% Size: 1” Thickness: 0.125”
Sputtering is a reliable method for depositing thin films from diverse materials onto various substrate shapes and sizes. The process using sputtering targets is repeatable and scalable, suitable for both small research projects and larger production batches. Chemical reactions can occur on the target surface, in-flight, or on the substrate depending on process conditions. While complex, sputter deposition provides precise control over film growth and microstructure.
Applications of Sputtering Targets
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Thin Film Deposition: Material is eroded from a “target” and deposited onto a “substrate,” such as a silicon wafer.
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Semiconductor Etching: Sputter etching is used when high anisotropy is required and selectivity is not a concern.
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Analytical Applications: Gradual etching of the target allows composition analysis, including detection of very low impurity levels, as in Secondary Ion Mass Spectroscopy (SIMS).
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Space Applications: Sputtering contributes to space weathering, altering physical and chemical properties of airless bodies like the Moon and asteroids.
About Bismuth Ferrite (BiFeO3)
Bismuth ferrite (BiFeO3) is an inorganic compound with a perovskite structure and is one of the most promising multiferroic materials. Targets are typically made by high-temperature sintering or recrystallization of Bi and Fe oxide compounds to obtain single-phase BiFeO3. Indium bonding is recommended for these targets.
Bismuth ferrite is a Pb-free ferroelectric (FE) material known for its exceptional properties, including high remnant polarization, high Curie temperature, and high antiferromagnetic Néel temperature. It uniquely exhibits both magnetic and ferroelectric behavior at and above room temperature. Its polarization-induced photovoltaic properties, due to a large remnant polarization and direct band gap (3.3 eV), make BiFeO3 films highly suitable for studying the ferroelectric photovoltaic effect, outperforming many other ferroelectric materials.
