Barium Zirconate (BaZrO₃) Sputtering Targets
Purity: 99.99% Size: 3” Thickness: 0.250”
Overview:
Barium Zirconate sputtering targets are designed for precise thin film deposition on diverse substrates. The sputtering process is reliable and scalable, suitable for both research and medium-to-large production batches. Reactions can occur on the target surface, in-flight, or on the substrate, providing controlled growth and microstructure of deposited films.
Applications:
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Thin film deposition on silicon wafers and other substrates.
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Semiconductor etching requiring high anisotropy.
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Analytical processes such as SIMS for measuring composition and detecting trace impurities.
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Space research applications including studies of space weathering on airless bodies.
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Electroceramic uses in semiconductors, CVD/PVD displays, and optical devices.
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Ferroelectric and dielectric thin-film applications.
Material Properties:
Barium Zirconate (BaZrO₃) is an electroceramic with excellent electrical properties, chemical stability, and compatibility with PVD and CVD deposition techniques. Its high purity ensures consistent performance for advanced electronic, optical, and ferroelectric applications.
