Barium Zirconate (BaZrO₃) Sputtering Targets
Purity: 99.99% Size: 3” Thickness: 0.125”
Overview:
Barium Zirconate sputtering targets are engineered for reliable thin film deposition on a variety of substrates. The sputtering process is highly repeatable and scalable, suitable for both research and medium-to-large production batches. Depending on process parameters, chemical reactions can occur on the target surface, in-flight, or on the substrate, giving experts precise control over film growth and microstructure.
Applications:
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Thin film deposition on substrates such as silicon wafers.
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Semiconductor etching with high anisotropy requirements.
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Analytical processes like SIMS to determine composition and detect trace impurities.
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Space research applications, including space weathering studies on asteroids and the Moon.
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Electroceramic applications in semiconductors, CVD/PVD displays, and optical devices.
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Ferroelectric and dielectric thin-film applications.
Material Properties:
Barium Zirconate (BaZrO₃) is an electroceramic known for its excellent electrical properties, chemical stability, and compatibility with PVD and CVD deposition methods. Its high purity ensures consistent performance for advanced electronic, optical, and ferroelectric applications.
