Barium Zirconate (BaZrO₃) Sputtering Targets
Purity: 99.99% Size: 1” Thickness: 0.125”
Overview:
Barium Zirconate sputtering targets are designed for precise thin film deposition on various substrates. The sputtering process is highly controllable, repeatable, and scalable from small research experiments to medium and large production batches. Chemical reactions can occur on the target surface, in-flight, or on the substrate, allowing experts precise control over film growth and microstructure.
Applications:
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Thin film deposition on silicon wafers and other substrates.
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Semiconductor etching where high anisotropy is required.
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Analytical applications including SIMS for material composition and trace impurity detection.
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Space research simulating space weathering on airless bodies such as asteroids and the Moon.
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Electroceramic applications in semiconductors, CVD/PVD displays, and optical devices.
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Ferroelectric and dielectric thin-film applications.
Material Properties:
Barium Zirconate (BaZrO₃) is a high-purity electroceramic material prized for its stable electrical properties and compatibility with advanced deposition techniques. It ensures uniform, high-quality thin films suitable for electronic, optical, and ferroelectric applications.
