Barium Titanate (BaTiO₃) Sputtering Targets
Purity: 99.99% | Size: 5” | Thickness: 0.250”
Overview:
Barium Titanate (BaTiO₃) sputtering targets are high-purity ceramic materials designed for precise and reliable thin-film deposition. Sputtering is a widely used technique capable of depositing films onto a variety of substrate shapes and sizes. The process is highly repeatable and can be scaled from small R&D work to medium and large production batches. Depending on the process parameters, chemical reactions can occur on the target surface, during flight, or on the substrate, offering extensive control over film growth and microstructure.
Applications of Sputtering Targets:
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Thin Film Deposition: Transfers material from the target onto substrates such as silicon wafers with excellent uniformity.
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Semiconductor Etching: Used in sputter etching where high anisotropy is required and selectivity is less critical.
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Material Analysis: Useful in applications such as Secondary Ion Mass Spectrometry (SIMS), where sputtering enables measurement of composition and detection of trace impurities.
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Space Science: Sputtering simulates natural space weathering, contributing to the study of surface changes on airless bodies like asteroids and the Moon.
Material Properties:
Barium Titanate (BaTiO₃) is an inorganic compound that appears as a white powder and becomes transparent when formed into large crystals. It is a ferroelectric ceramic material known for:
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Photorefractive behavior
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Piezoelectric properties
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Strong dielectric performance
These characteristics make BaTiO₃ films suitable for a wide range of electronic applications.
Common Uses of BaTiO₃ Films:
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Electronic ceramics
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Detectors
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Capacitors
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Sensors
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Other advanced electronic device assemblies.
