Barium Titanate (BaTiO₃) Sputtering Targets
Purity: 99.99% Size: 4” Thickness: 0.250”
Overview:
Barium Titanate (BaTiO₃) sputtering targets are high-purity ceramic materials designed for reliable and precise thin-film deposition. Sputtering technology enables uniform coating on a wide range of substrate shapes and sizes. The process is stable, repeatable, and scalable—from small R&D operations to medium and large production batches. Depending on deposition parameters, chemical reactions may occur on the target surface, during particle transport, or on the substrate, giving excellent control over film quality and microstructure.
Applications of Sputtering Targets:
-
Thin Film Deposition: Transfers material from the target to substrates such as silicon wafers through controlled erosion.
-
Semiconductor Etching: Ideal for applications requiring high anisotropy where selectivity is not a key requirement.
-
Material Analysis: Used in SIMS (Secondary Ion Mass Spectrometry) for composition analysis and detection of trace impurities through controlled sputtering.
-
Space Research: Helps simulate space weathering processes that affect airless bodies such as asteroids and lunar surfaces.
Material Properties of BaTiO₃:
Barium Titanate (BaTiO₃) is an inorganic ceramic compound appearing white in powder form and transparent as large crystals. It exhibits:
-
Ferroelectric behavior
-
Photorefractive effects
-
Piezoelectric properties
These characteristics make BaTiO₃ suitable for advanced electronic applications.
Common Uses:
-
Electronic ceramic components
-
Sensors
-
Capacitors
-
Detectors
-
Various electronic device assemblies requiring precise ferroelectric or piezoelectric thin films.
