Barium Titanate (BaTiO₃) Sputtering Targets
Purity: 99.99% Size: 3” Thickness: 0.125”
Barium Titanate (BaTiO₃) sputtering targets are high-purity ceramic materials designed for precise thin-film deposition. Sputtering enables the controlled transfer of material from the target to substrates of various shapes and sizes. This process is repeatable and scalable, suitable for both small research projects and medium-to-large production batches. Depending on process parameters, chemical reactions may occur on the target surface, in-flight, or on the substrate, providing experts with precise control over film growth and microstructure.
Applications
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Thin Film Deposition: Erosion from the target deposits material uniformly on substrates such as silicon wafers.
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Semiconductor Etching: Sputter etching achieves high anisotropy where selectivity is not critical.
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Material Analysis (SIMS): Sputtering allows composition analysis and trace impurity detection by mass spectrometry.
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Space Research: Sputtering simulates space weathering, altering surfaces of airless bodies like asteroids and the Moon.
Material Properties
Barium Titanate is a white inorganic compound (BaTiO₃), transparent in large crystal form. It is a ferroelectric ceramic exhibiting photorefractive and piezoelectric properties, making it ideal for:
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Electronic ceramics
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Capacitors
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Sensors
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Detectors
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Other electronic device assemblies.
