Barium Titanate (BaTiO₃) Sputtering Targets
Purity: 99.99% Size: 2” Thickness: 0.250”
Barium Titanate (BaTiO₃) sputtering targets are high-purity ceramic materials engineered for precise thin-film deposition. Sputtering allows material to transfer from the target to various substrates with exceptional control over film growth and microstructure. The process is repeatable and scalable, suitable for small research projects as well as medium-to-large production batches. Depending on process parameters, chemical reactions may occur on the target surface, in-flight, or on the substrate, offering experts precise control over deposition quality.
Applications
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Thin Film Deposition: Uniform deposition on substrates such as silicon wafers.
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Semiconductor Etching: Achieves high anisotropy where selectivity is not critical.
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Material Analysis (SIMS): Enables trace impurity detection and composition analysis via mass spectrometry.
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Space Research: Simulates space weathering, altering the physical and chemical properties of airless bodies like asteroids and the Moon.
Material Properties
Barium Titanate is a white inorganic compound (BaTiO₃) that is transparent when prepared as large crystals. It is a ferroelectric ceramic exhibiting photorefractive and piezoelectric properties, making it suitable for:
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Electronic ceramics
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Detectors
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Capacitors
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Sensors
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Other electronic device assemblies.
