Barium Titanate (BaTiO₃) Sputtering Targets
Purity: 99.99% Size: 2” Thickness: 0.125”
Barium Titanate (BaTiO₃) sputtering targets are high-purity ceramic materials designed for precise thin-film deposition. Sputtering allows controlled transfer of material from the target to various substrates, with chemical reactions occurring on the target surface, in-flight, or on the substrate depending on process parameters. This process is repeatable, scalable, and offers experts precise control over film growth and microstructure, suitable for research and large-scale production.
Applications
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Thin Film Deposition: Uniform coating on substrates such as silicon wafers.
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Semiconductor Etching: Provides high anisotropy for cases where selectivity is less critical.
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Material Analysis (SIMS): Enables composition and impurity analysis at trace levels.
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Space Research: Simulates space weathering effects on airless bodies like asteroids and the Moon.
Material Properties
Barium Titanate is a white inorganic compound (BaTiO₃) that is transparent when prepared as large crystals. It is a ferroelectric ceramic with photorefractive and piezoelectric properties, suitable for:
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Electronic ceramics
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Detectors
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Capacitors
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Sensors
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Assembly of various electronic devices.
