Barium Titanate (BaTiO₃) Sputtering Targets
Purity: 99.99% Size: 1” Thickness: 0.125”
Barium Titanate (BaTiO₃) sputtering targets are high-purity ceramic materials designed for precise thin-film deposition. Sputtering transfers material from the target to various substrates, with chemical reactions occurring on the target surface, in-flight, or on the substrate depending on process parameters. This process is scalable from research projects to medium and large production batches, offering precise control over film growth and microstructure.
Applications
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Thin Film Deposition: Uniform coatings on substrates such as silicon wafers.
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Semiconductor Etching: High anisotropy etching where selectivity is not critical.
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Material Analysis (SIMS): Detects composition and trace impurities with high sensitivity.
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Space Research: Simulates space weathering on airless bodies such as asteroids and the Moon.
Material Properties
Barium Titanate is a white inorganic compound (BaTiO₃) that appears transparent in large crystal form. It is a ferroelectric ceramic exhibiting photorefractive and piezoelectric properties, making it suitable for:
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Electronic ceramics
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Detectors
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Capacitors
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Sensors
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Assembly of electronic devices.
