Barium Titanate (BaTiO₃) Sputtering Targets
Purity: 99.99% Size: 4” Thickness: 0.125”
Overview:
Barium Titanate sputtering targets are ideal for depositing uniform thin films on a variety of substrates. The sputtering process is repeatable, scalable, and highly controllable, making it suitable for both research and large-scale production. Chemical reactions may occur on the target surface, in-flight, or on the substrate, giving experts precise control over film growth and microstructure.
Applications:
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Thin film deposition for semiconductors, electronic ceramics, and optical devices.
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Etching in semiconductor applications requiring high anisotropy.
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Analytical techniques, such as SIMS, for determining target composition and trace impurities.
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Space research simulating space weathering effects on airless celestial bodies.
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Ferroelectric, piezoelectric, and photorefractive device fabrication.
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Components for electronic devices including detectors, capacitors, and sensors.
Material Properties:
Barium Titanate (BaTiO₃) is a ferroelectric ceramic with piezoelectric and photorefractive properties. It appears as a white powder and is transparent in large crystals. It is widely used in electronic ceramics, thin-film devices, and advanced sensor applications, offering excellent performance and reliability.
