Barium Titanate (BaTiO₃) Sputtering Targets
Purity: 99.99% Size: 2” Thickness: 0.125”
Overview:
Barium Titanate sputtering targets are engineered for precise thin film deposition on a variety of substrates. The sputtering process is highly controllable and scalable, suitable for research and industrial applications. Chemical reactions may occur on the target surface, in-flight, or on the substrate, allowing experts to finely tune the growth and microstructure of the films.
Applications:
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Thin film deposition for semiconductors, electronic ceramics, and optical devices.
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Etching in semiconductor applications requiring high anisotropy.
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Analytical uses such as SIMS to measure composition and trace impurities.
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Space research simulating space weathering on airless bodies like asteroids and the Moon.
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Fabrication of ferroelectric, piezoelectric, and photorefractive devices.
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Manufacturing of electronic components including detectors, capacitors, and sensors.
Material Properties:
Barium Titanate (BaTiO₃) is a ferroelectric ceramic that exhibits piezoelectric and photorefractive properties. It appears as a white powder and is transparent in large crystal form. Its properties make it ideal for electronic ceramics, thin-film devices, and advanced sensor applications, offering high performance and reliability.
