Barium Titanate (BaTiO₃) Sputtering Targets – Elastomer
Purity: 99.99% | Size: 1” | Thickness: 0.125”
Overview:
Barium titanate (BaTiO₃) sputtering targets are high-purity ceramic materials designed for precise thin film deposition. Sputtering is a well-established technique capable of transferring material from a target to diverse substrate surfaces, allowing controlled growth and microstructure. The process is scalable from small R&D projects to medium and large production batches, with chemical reactions occurring on the target surface, in-flight, or on the substrate depending on process parameters.
Applications:
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Thin Film Deposition: Erosion of the target deposits uniform thin films onto substrates such as silicon wafers.
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Semiconductor Etching: Sputter etching provides high anisotropy where selectivity is not critical.
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Material Analysis: Enables composition analysis, including detection of trace impurities, using techniques like secondary ion mass spectrometry (SIMS).
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Space Applications: Sputtering simulates space weathering effects on airless bodies like asteroids and the Moon.
Material Properties:
Barium titanate is a white inorganic compound that appears transparent when prepared as large crystals. As a ferroelectric ceramic, it exhibits photorefractive and piezoelectric properties, making it ideal for use in electronic ceramics. Films produced from these targets are suitable for:
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Detectors
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Capacitors
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Sensors
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Other electronic device assemblies
Key Features:
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High-purity (99.99%) BaTiO₃ for reliable thin film growth
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Compatible with semiconductor, CVD, and PVD processes
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Supports ferroelectric and piezoelectric applications
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Enables precise control over microstructure and deposition
