Barium Strontium Titanate (BaₓSr₁₋ₓTiO₃) Sputtering Targets – Elastomer
Purity: 99.99% Size: 8” Thickness: 0.125”
Barium Strontium Titanate (BST) sputtering targets are high-purity ceramic materials designed for precision thin-film deposition. Sputtering transfers material from the target to diverse substrates, with chemical reactions occurring on the target surface, in-flight, or on the substrate depending on process parameters. The process is scalable from small research projects to medium and large production batches, allowing precise control over film growth and microstructure.
Applications
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Thin Film Deposition: Uniform coatings on substrates such as silicon wafers.
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Semiconductor Etching: High-anisotropy etching where selectivity is not critical.
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Material Analysis (SIMS): Enables trace impurity detection and composition analysis.
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Space Research: Simulates space weathering on airless bodies like asteroids and the Moon.
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Microwave & RF Devices: Ferroelectric thin films for tunable delay lines, resonators, phase shifters, and varactors.
Material Properties
Barium Strontium Titanate (BST) is a solid solution of BaTiO₃ and SrTiO₃, exhibiting excellent dielectric properties. Thin films deposited by sputtering are ideal for ferroelectric devices and tunable microwave applications. BST properties can be optimized by adjusting:
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Ba/Sr ratio
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Oxygen vacancies
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Film thickness and grain size
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Doping concentrations
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High-temperature annealing
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Multilayer structures
These adjustments allow for high dielectric constant, tunability, and low dielectric loss, meeting advanced electronic device requirements.
