Antimony Telluride (Sb₂Te₃) Sputtering Targets
Purity: 99.999% | Size: 4” | Thickness: 0.250”
Antimony telluride sputtering targets are designed for precise thin-film deposition across a variety of substrate shapes and sizes. The sputtering process is reliable, repeatable, and scalable, supporting both small research projects and medium-to-large production batches. Depending on process parameters, chemical reactions can occur on the target surface, in-flight, or on the substrate, allowing experts precise control over film growth and microstructure.
Applications:
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Thin-film deposition on substrates such as silicon wafers.
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Semiconductor etching requiring high anisotropy.
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Material analysis, including SIMS, for detecting trace impurities.
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Space applications: sputtering contributes to space weathering on airless bodies like asteroids and the Moon.
About Antimony Telluride (Sb₂Te₃):
Antimony telluride is an inorganic grey crystalline solid with a layered structure of two atomic sheets of antimony and three atomic sheets of tellurium, held together by van der Waals forces. It is a well-established thermoelectric material, widely used in thermoelectric devices such as power generators, coolers, and thermal sensors due to its ability to efficiently convert heat and electricity. Sb₂Te₃ sputtering targets are suitable for coating flexible materials and for applications in the temperature range of 200 K to 400 K, benefiting from excellent electrical conductivity and thermoelectric performance.
