Antimony Telluride (Sb₂Te₃) Sputtering Targets
Purity: 99.999% | Size: 3” | Thickness: 0.250”
Antimony telluride sputtering targets are designed for high-precision thin-film deposition on various substrate shapes and sizes. The sputtering process is reliable, repeatable, and scalable, supporting both small-scale research and medium-to-large production batches. Chemical reactions can occur on the target surface, in-flight, or on the substrate depending on process parameters, giving experts precise control over film growth and microstructure.
Applications:
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Thin-film deposition on substrates such as silicon wafers.
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Semiconductor etching requiring high anisotropy.
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Material analysis, including SIMS, for trace impurity detection.
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Space applications: sputtering contributes to space weathering on airless bodies like asteroids and the Moon.
About Antimony Telluride (Sb₂Te₃):
Antimony telluride is a grey crystalline solid with a layered structure consisting of two atomic sheets of antimony and three atomic sheets of tellurium, held together by weak van der Waals forces. It is a widely used thermoelectric material suitable for power generators, coolers, and thermal sensors due to its ability to efficiently convert heat into electricity. Sb₂Te₃ sputtering targets are ideal for coating flexible materials and operate effectively in the temperature range of 200 K to 400 K, thanks to their excellent electrical conductivity and thermoelectric performance.
