Antimony Telluride (Sb₂Te₃) Sputtering Targets
Purity: 99.999% | Size: 2” | Thickness: 0.125”
Antimony telluride sputtering targets enable precise thin-film deposition on various substrate shapes and sizes. The sputtering process is repeatable and scalable, suitable for small R&D projects as well as medium-to-large production batches. Chemical reactions can occur on the target surface, in-flight, or on the substrate, allowing fine control over film growth and microstructure.
Applications:
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Thin-film deposition on silicon wafers and other substrates.
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Semiconductor etching requiring high anisotropy.
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Material analysis, including SIMS, for trace impurity detection.
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Space applications: contributes to space weathering on airless bodies such as asteroids and the Moon.
About Antimony Telluride (Sb₂Te₃):
Sb₂Te₃ is a grey crystalline solid with a layered structure—two atomic sheets of antimony and three of tellurium held by van der Waals forces. It is a well-established thermoelectric material, used in power generators, coolers, and thermal sensors, performing effectively in the 200 K–400 K range due to its excellent electrical conductivity. These sputtering targets are also suitable for coating flexible materials.
