Antimony Telluride (Sb₂Te₃) Sputtering Targets
Purity: 99.99% | Size: 3” | Thickness: 0.125”
Antimony telluride sputtering targets are designed for high-precision thin-film deposition across diverse substrate shapes and sizes. The sputtering process is reliable, repeatable, and scalable, supporting both small-scale R&D and medium-to-large production batches. Chemical reactions can occur on the target surface, in-flight, or on the substrate depending on process parameters, giving experts precise control over film growth and microstructure.
Applications:
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Thin-film deposition on substrates such as silicon wafers.
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Semiconductor etching with high anisotropy.
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Material analysis, including SIMS, for trace impurity detection.
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Space applications: sputtering contributes to space weathering on airless bodies like asteroids and the Moon.
About Antimony Telluride (Sb₂Te₃):
Antimony telluride is a grey crystalline solid with a layered structure, consisting of two antimony atomic sheets and three tellurium atomic sheets, held together by weak van der Waals forces. It is a well-established thermoelectric material used in power generators, coolers, and thermal sensors due to its ability to directly convert heat into electricity. Sb₂Te₃ sputtering targets are also suitable for coating flexible materials and perform effectively in the 200 K–400 K temperature range thanks to their good electrical conductivity and thermoelectric properties.
