Antimony (Sb) Sputtering Targets
Purity: 99.999% | Size: 2” | Thickness: 0.250”
Antimony sputtering targets enable precise thin-film deposition on diverse substrates. The sputtering process is repeatable, scalable, and suitable for both small R&D projects and large production batches. Reactions can occur on the target surface, in-flight, or on the substrate, providing experts with extensive control over film growth and microstructure.
Applications:
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Thin-film deposition on substrates like silicon wafers.
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Semiconductor etching requiring high anisotropy.
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Material analysis, including SIMS, for impurity detection.
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Space applications: contributes to space weathering on airless bodies.
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Fire-retardant coatings.
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Optoelectronic devices: LEDs, laser diodes, photodiodes, and solar cells.
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Transparent conductive films via antimony alloys (e.g., indium-antimony oxide).
About Antimony (Sb):
Antimony (atomic number 51) is a bluish-white metalloid in Group 15, chemically similar to arsenic. It is used as a dopant in n-type silicon for diodes, infrared detectors, and Hall-effect devices. Antimony alloys with elements like tin and indium are widely applied in coatings, optoelectronics, and transparent conductive films.
