Antimony (Sb) Sputtering Targets
Purity: 99.999% | Size: 2” | Thickness: 0.125”
Antimony sputtering targets are designed for precise thin-film deposition across a wide variety of substrate shapes and sizes. The sputtering process is highly repeatable and scalable—suitable for both small R&D environments and medium-to-large industrial production batches. Depending on process parameters, chemical reactions may occur on the target surface, during particle transport, or on the substrate itself. This flexibility provides experts with extensive control over film growth, structure, and material characteristics.
Applications of Sputtering Targets
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Thin-film deposition: Erosion of target material onto substrates such as silicon wafers.
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Semiconductor etching: Used where high anisotropy is required and selectivity is not a major concern.
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Material analysis (SIMS): Enables precise detection of atomic species and trace impurities through controlled sputtering.
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Space science: Sputtering contributes to space weathering on airless bodies like asteroids and the Moon.
About Antimony (Sb)
Antimony (atomic number 51) is a bluish-white metalloid in Group 15, chemically similar to arsenic but without the same toxicity concerns. Its natural abundance in Earth’s crust ranges from 0.2 to 0.5 ppm. Antimony exhibits strong fire-retardant properties, making it valuable for flame-resistant coatings.
It is widely used in optoelectronic components such as:
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LEDs
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Laser diodes
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Photodiodes
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Solar cells
In semiconductor applications, antimony is commonly used as a dopant in n-type silicon wafers for diodes, infrared detectors, and Hall-effect devices. It also forms useful alloys with tin and other metals. When combined with indium—as in indium antimony oxide—the resulting material is used as a sputtering source for transparent conductive films.
