Antimony (Sb) Sputtering Targets with Indium
Purity: 99.999% | Size: 3” | Thickness: 0.125”
Antimony sputtering targets with indium enable high-precision thin-film deposition on a wide variety of substrate shapes and sizes. The sputtering process is reliable and scalable, supporting both small R&D projects and medium-to-large production batches. Reactions can occur on the target surface, in-flight, or on the substrate, allowing precise control over film growth and microstructure.
Applications:
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Thin-film deposition on substrates such as silicon wafers.
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Semiconductor etching requiring high anisotropy.
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Material analysis (e.g., SIMS) for trace impurity detection.
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Space applications, including surface modification of airless bodies like asteroids and the Moon.
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Fire-retardant coatings.
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Optoelectronic devices: LEDs, laser diodes, photodiodes, and solar cells.
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Transparent conductive films using indium-antimony oxide alloys.
About Antimony (Sb):
Antimony (atomic number 51) is a bluish-white metalloid in Group 15 of the periodic table, with chemical properties similar to arsenic. It is used in semiconductors as a dopant, in optoelectronic devices, and in fire-retardant materials. Alloys with elements like tin or indium provide tailored properties for specialized sputtering applications.
