Antimony (Sb) Sputtering Targets with Elastomer
Purity: 99.999% | Size: 2” | Thickness: 0.125”
Antimony sputtering targets with elastomer enable precise thin-film deposition on various substrate shapes and sizes. The sputtering process is reliable and scalable, suitable for both small-scale research and medium-to-large production batches. Reactions can occur on the target surface, in-flight, or on the substrate, allowing expert control over film growth and microstructure.
Applications:
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Thin-film deposition on substrates like silicon wafers.
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Semiconductor etching with high anisotropy requirements.
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Material analysis (e.g., SIMS) for trace impurity detection.
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Space applications, including modification of airless bodies such as asteroids and the Moon.
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Fire-retardant coatings.
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Optoelectronic devices: LEDs, laser diodes, photodiodes, and solar cells.
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Transparent conductive films when combined with elements like indium.
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Coating flexible elastomeric materials.
About Antimony (Sb):
Antimony (atomic number 51) is a bluish-white metalloid in Group 15, with chemical properties similar to arsenic. It is used as a dopant in semiconductors, in optoelectronic devices, and for fire-retardant materials. Antimony alloys with elements like tin or indium offer customized properties for specialized sputtering applications, including coatings on elastomeric substrates.
