Product Table
| Property | Specification |
|---|---|
| Material | Yttrium (Y) |
| Purity | 99.9% |
| Size | 4” |
| Thickness | 0.125” |
| Form | Sputtering Target |
Description
Yttrium (Y) sputtering targets are high-purity materials used to deposit thin films on various substrates. Sputtering technology ensures consistent, repeatable coatings with precise microstructural control. It is suitable for both R&D and medium-to-large production batches, with reactions occurring on the target, in-flight, or on the substrate depending on process parameters.
Applications
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Thin-film deposition on substrates such as silicon wafers
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Semiconductor sputter etching requiring high anisotropy without selectivity issues
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Material analysis (e.g., SIMS) to detect very low impurity concentrations
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Space research, simulating space weathering effects on airless bodies like asteroids and the Moon.
